Atomic Layer Deposition

Picosun is the leading supplier of high quality Atomic Layer Deposition (ALD) thin film coating solutions for industrial production.

PICOSUN™ ALD product portfolio ranges from fully automated, SEMI compliant batch and cluster systems for high volume manufacturing to smaller scale R&D and pre-pilot production tools. Production-proven coating solutions for IC, MEMS, LED, sensor, and 3D component processing are mastered with world-class process quality, the leading equipment design, the most comprehensive process support, and the best customer care

Picosun

Picosun R-Series process tools

Manual or semi-automatic processing for research and development. R-series ALD tools enable the deposition of the highest quality ALD films with excellent uniformity even on the most challenging throughporous, ultra-high aspect ratio and nanoparticle samples. The unique scalability of the Picosun R-series tools enables smooth transition of the research results into production with Picosun P-series ALD systems.
Picosun R-Series process tools
Picosun P-series process tools

Picosun P-series process tools

Fully automatic single or batch processing for high volume manufacturing. The fully automated, vacuum cluster and production line compatible P-series tools ensure maximum yields and cost-efficient throughput with world leading process purity and uniformity. The compact, highly functional design of the Picosun P-series tool saves expensive facility space, enables quick and easy maintenance and results in minimal system-down time. The P-1000 ALD reactor has an extra-large reaction chamber for wafers up to 450mm diameter, sheets of glass and large batches of 3D objects.

PICOPLATFORM Vacuum cluster tools

The PICOPLATFORM system consists of several ALD reactors clustered around a central vacuum robot loading and controlling unit for automatic wafer handling without vacuum break. The system can also be extended at any time by clustering with other process units such as pre/ post treatment and deposition modules.
PICOPLATFORM Vacuum cluster tools
Picoplasma Source System

Picoplasma Source System

The innovative PICOPLASMA plasma-enhanced ALD (PEALD) source system is based on a highly Advance ion-free remote plasma source. This enables the processing of even the most sensitive substrates without plasma damage, all the while retaining high reactive species flux. The PICOPLASMA source system can be mounted on existing Picosun ALD reactors or the whole PEALD system can be installed as one compact, small footprint deposition unit. The system can also be fully automated by integrating it into the PICOPLATFORM cluster tool.

Roll-to-roll chamber for continuous ALD

Continuous ALD enables applications such as printed electronics, OLED encapsulation, thin film batteries, smart textiles, organic sensors, recyclable or biodegradable packaging materials and flexible displays. The PICOSUN roll-to-roll ALD chamber accommodates substrates up to 300 mm
Roll-to-roll chamber for continuous ALD
POCA and PICOVIBE particle coating systems

POCA and PICOVIBE particle coating systems

Picosun offers powder coating solutions for both industry and R&D. The POCA 300 powder coating cartridge can be directly integrated into production and R&D tools Picosun’s novel, innovative PICOVIBE™ feature improves the powder coating process even further by enhancing the distribution of the precursor vapours inside the powder batch, resulting in uniform film formation on every particle.

PICOFLOW diffusion enhancer

The PICOFLOW diffusion enhancer enables and improves the coating of deep trenches and other high aspect ratio samples, as well as porous, through-porous, tortuous, powderous or otherwise complicated nanostructures.
PICOFLOW diffusion enhancer
Glovebox and UHV compatibility

Glovebox and UHV compatibility

All Picosun ALD system can be integrated with various type of glove boxes and can also be made ultra-high vacuum compatible.