Atomic Layer Deposition
Picosun is a direct descendant of the very beginning of Atomic Layer Deposition. ALD was invented in Finland in 1974 by Dr.Tuomo Suntola, Member of the Picosun Board of Directors. Their CTO Sven Lindfors’ has designed outstanding ALD systems continuously since 1975. Combined, Picosun employees share over 200 years of ALD experience forming what many describe as “by far, the best ALD team ever”.
PICOSUN® R-SERIES ALD process tools
Manual or semi-automatic processing for R&D and pilot production
|Substrate size and type||50 – 200 mm single wafers
Wafer minibatch up to 150 mm
156 mm x 156 mm solar Si wafers
Powders and particles
Through-porous and HAR samples
50 – 500 °C, higher on request
|Substrate loading options||
Pneumatic lift (manual loading)
|Precursors||Liquid, solid, gas, ozone, plasma
Up to 12 sources with 6 separate inlets
Manual or automated processing for pilot and full scale production.
PICOPLASMA™ source system
- Model R-200 Standard for basic ALD research
- Model R-200 Advanced for even more flexibility with more precursor sources and plasma-enhanced ALD
- Highly versatile, cost-efficient, modular, and customizable ALD tools for single or batch wafer processing, 3D objects, high aspect ratio (such as deep trench and via) structures, through-porous, and particle samples
PICOSUN™ P-300 ALD process tools
Fully automatic single wafer and batch processes for high volume manufacturing
- Model P-300S with platform integration for single wafer processing of 200 mm or 300 mm diameter wafers
- Model P-300B for batch processing up to 300 mm diameter wafers
PICOSUN™ P-1000 ALD process tool
The flagship of ultra-high volume ALD manufacturing
The P-1000 ALD reactor is designed to accommodate batches of wafers up to 450 mm in size and large sheets of glass. Alternatively, the P-1000 system is ideal for large batches of 3D objects. The P-1000 ALD system represents Picosun’s leading technical design concept and fulfills the most stringent industrial standards. Easy operation, maintenance, and switching of sample size and type with different carriers provides ultimate productivity and flexibility for a wide variety of industrial manufacturing applications.
Roll-to-roll ALD chamber
PICOFLOAT™ particle coating system
Glove box compatibility
All PICOSUN™ ALD tools can be integrated with various types of glove boxes to eliminate handling of moisture sensitive substrates in the air. Tools with separate load locks or the standard elevator can both be connected with a leak tight seal to the glove box wall or bottom plate.
A glove box is also ideal for using or storing toxic, very volatile, oxygen or moisture sensitive precursors.
All PICOSUN™ ALD systems can be made ultra-high vacuum (UHV) compatible either by integration with a pump-down chamber or by modifying the tool itself enabling pump-down down to UHV region. UHV ALD tools can be integrated with other deposition and measurement tools to make possible high-quality interface between ALD films and III-V semiconductors, for example.
For more detailed information on Picosun’s process tools and applications click hereAlternatively contact us here