Spin Developer for Large Wafers & Substrates

SiSTEM Technology proudly presents the Cost Effective Equipment Apogee 450 Spin Developer, a paradigm of engineering excellence designed to meet the rigorous demands of advanced material and wafer processing. Engineered for precision, and compatibility, the Apogee 450 Spin Developer is your solution to achieving unparalleled results in developing processes for 300 mm and larger wafers, as well as large-scale substrates and LCD panels up to 14” × 14”.

Compact, High-Performance Design

The Apogee 450 Spin Developer is a testament to efficient design, offering the highest horsepower in its class within a compact footprint. This space-saving marvel does not compromise on power, ensuring your workspace is optimised without sacrificing performance.

Intuitive Interface

Featuring a full-colour, 7-inch touch screen display and an alphanumeric-capable GUI, the Apogee 450 Developer provides an intuitive user experience. Its interface capabilities make complex process management straightforward and accessible.

Unmatched Chemical Compatibility

Constructed with a high-density polyethylene (HDPE) spin bowl, the developer is built to withstand a wide array of chemical solvents, ensuring durability and reliability in any chemical environment.

Flexible Installation Options

Designed for versatility, the Apogee 450 Developer offers both a durable benchtop design and an optional flange/deck mountable configuration, meeting the diverse needs of research & development laboratories and production facilities alike. The optional X-PRO Workstation installation further enhances its utility by integrating a stand-alone cabinet with an upper exhaust enclosure for effective fume control during processes.

Advanced DataStream Technology

Leverage the power of DataStream technology for seamless connectivity and data management. This feature allows for efficient uploading and downloading of process parameters, enhancing productivity and ensuring consistent results.

Versatile Bowl Configuration

The Apogee 450 Spin Developer’s bowl design features direct fanjet spray, side-angle puddle, and stream dispense options, alongside integrated drain and exhaust ports for safe and efficient operation.

Programmable to Perfection

Achieve precise control over your development process with virtually unlimited recipe program steps, 0.1-second resolution for step times, and bidirectional speed control. The ability to handle substrates from less than 1 cm to 450 mm round or 14” x 14” square ensures versatility across a broad range of applications.

High-Speed Capability

With spin speeds up to 6,000 rpm and acceleration up to 30,000 rpm/s unloaded, the Apogee 450 Spin Developer is engineered for efficient acceleration, ensuring quick and consistent development across all substrate sizes.

• Spin speed acceleration
  • 0 to 30,000 rpm/s unloaded
  • 0 to 23,000 rpm/s with a 300-mm substrate
  • 0 to 3,000 rpm/s with a 350mm x 6mm round recessed spin chuck
  • 0 to 400 rpm/s with a 14” × 14” × 1.1 mm photomask in a recessed chuck

Unparalleled Precision

The Apogee 450 Spin Developer boasts spin speed repeatability and resolution of less than 0.2 rpm, setting a new standard for precision in material processing.

Built to Last

An indirect drive system protects the spin motor from chemical exposure, while vacuum and lid interlocks enhance operational safety. With industry-leading reliability and uptime, the Apogee 450 Spin Developer is designed for longevity.

Warranty and Support

SiSTEM Technology stands behind the Apogee 450 Developer with a 1-year full warranty, complemented by free remote technical support and application process assistance for the life of the product directly from Cost Effective Equipment.

Specifications

Dimensions: 27-5/8” W × 30-3/4” D × 16” H*, with a machine weight of 115 lb (52.2 kg)

*H is with lid closed. With lid open H is 33” (83.8cm)

**With optional chimney hood, H is 24-3/4” (62.9cm) closed and 36” (91.5cm) open

Choosing the Cost Effective Equipment Apogee 450 Spin Developer means investing in a future where precision, efficiency, and reliability are not just goals, but standards. Designed for the lab and the fab, this system embodies 28 years of semiconductor tool development experience, delivering superior repeatability and sophisticated controls for every process. The Apogee 450 Spin Developer can also be inserted into the fully-customisable Cost Effective Equipment X-Pro II Workstation if you are looking for an integrated process station including spin coater(s) and/or bake plate(s).

Embrace the next level of material processing with the Cost Effective Equipment Apogee 450 Spin Developer, where innovative design meets unparalleled performance.

Contact SiSTEM Technology if you have any questions before requesting a quote and discover how this state-of-the-art equipment can revolutionise your photoresist development processes and help you achieve exceptional results.

Get a quote today for the Cost Effective Equipment Apogee 450 Spin Developer to experience the difference for yourself.