High Vacuum Deposition and Etch Systems

With a long history and broad experience as a high vacuum system designer and builder, Intlvac can provide you with prototype and production thin film coatings, or a deposition or etch system for your process. Their years of experience and knowledge are the key to your success.

Nanoquest – Ion Beam Etch

Nanoquest Pico:
A compact, low-cost Ion milling platform for advanced R & D
Process methods: Ion Beam Etching (IBE) Reactive Ion Beam Etching (RIBE)
Nanoquest I
Nanoquest I:
A compact, low cost platform for advanced Ion beam process

Process methods:
Ion Beam Etching (IBE)
Ion Beam Sputter Deposition
Ion Beam Assisted Deposition (IBAD)
Reactive Ion Beam Etching (RIBE)
Chemically Assisted Ion Beam
Etching (CAIBE)
Nanoquest II:
Ion Beam Etch platform for wafers up to 8 inches. Options Include:
IBS Deposition
Sputter Deposition
In-situ Camera
S.I.M.S. End-point Detection
Nanoquest II
Nanoquest III
Nanoquest III:
Multi-substrate ion milling system with next-gen RF ICP ion source.
22cm RF ICP Ion Source
Up to 3×6” Planetary
S.I.M.S. End-point Detection
Intlvac Pleiades:
Is a modular, multi-chamber array featuring customizable configuration for complex processes under vacuum.

Its enables the use of process modules such as:

  • Ion Beam Etching & Sputtering
  • E-Beam Evaporation - Lift Off
  • Thermal Evaporation
  • Oxide & Fluoride Evaporation
  • Magnetron Sputtering Oxides & Nitrides
  • Magnetron Sputtering Metals
  • Atomic Layer Deposition
Intlvac Pleiades
Nanochrome – Physicak Vapour Deposition

Nanochrome – Physical Vapour Deposition

Nanochrome Pico:
A compact, low-cost platform for advanced Thin Film Coating
Process methods:
Magnetron Sputtering
E-beam Evaporation
Thermal Evaporation
Ion Assisted Deposition
Knudson Cell Evaporation
Nanochrome I:
An R&D/Pilot Physical Vapour Deposition System Process methods:
Multi-Layered E-beam Deposition
Ion Beam Assisted Deposition (IBAD)
Thermal Evaporation)
Planar Magnetron Sputtering
Nanochrome I
Nanochrome II:
An R&D/Pilot Physical Vapour Deposition System. Process methods:
Ion Beam Assisted Deposition (IBAD)
RF, AC & Planar Magnetron Sputtering
Nanochrome IV:
Plasma Assisted Reactive Magnetron Sputtering
Key Benefits:
Exceptional process repeatability
Stable deposition rates up to 10 Å/Sec
Very low arcing
Capable of producing films with 100+ layers
Optional load-lock operation
Nanochrome II
PECVD: Diamond Like Carbon
PECVD: Diamond Like Carbon:
The Intlvac DLC system fully automated, suitable for applications in Optics, Bio & Mechanical Engineering.

DLC is available on wide variety of substrates:

IR Optics: Silicon, Germanium, Chalcogenides

Plastics: Ultem, Polycarbonate, Polyimide, PEEK

Glass: Crown Glass, UVFS, SF11, Sapphire

Metals: Aluminium, Copper, High-carbon Steel

Gridless End-Hall Ion Sources

For Ion Assisted Thin Film Deposition & Substrate Cleaning
Mark I Ion Source
The Mark I End-Hall is ideal for small research and development and pilot production e-beam coating systems.

  • Reactive gas compatible
  • Low contamination
  • Rugged and reliable
  • Ideal for small systems
Mark II Ion Source
The Mark II is the industry standard source for optical coating systems and is the most widely used ion assist source.

  • Production proven design
  • Reactive gas compatible
  • Low contamination
  • Numerous options available
Water-Cooled Mark II Ion Source
The Water-Cooled Mark II Ion Source adds efficient cooling for processes requiring low temperatures and reduced cycle times. Engineered and tested to withstand rigorous production environments, the Water-Cooled Mark II has a distinctive anode design which promotes excellent heat transfer out of the vacuum chamber and away from substrates

Water-Cooled Features & Benefits
  • Dramatically reduced substrate temperatures
  • Elimination of cool-down prior to venting
  • Greater ion beam stability/control
  • Reduced stress
  • Increased production throughput
  • Reproducible film properties
Gridless End-Hall Ion Sources
Mark II – HCES
Mark II – HCES
The Mark II ion source is configured with a Hollow Cathode Electron Source (HCES) to permit long run times with reactive gases while maintaining consistent and reliable operation. Ideal for oxygen and other long reactive processes, the HCES provides sufficient electron emission for ionization and beam neutralization. When combined with the Water-cooled anode, the Mark II-HCES provides the coolest operation of the Mark II Series.

  • Filament less operation
  • Reduced contamination
  • Cool source operation
Gridless Ion Source Power Supplies

Reverse compatible
  • Remote I/O is pin to pin compatible Faster Mark I & Mark II Power Supply
  • operation & response
  • Digital & Switching technology
  • Quick start (learn)
  • More stable operation
  • Dual regulation
  • More reliable
  • Low stored energy & output limits
  • Longer filament lifetime
  • Filament soft-start
  • Triple filament lifetime option
Gridless Ion Source Power Supplies
Benefits of A Water-Cooled anode
Benefits of A Water-Cooled anode
Benefits of A Water-Cooled anode
Promote amorphous/crystalline growth
  • Near bulk indices
Increased packing density
  • Eliminates water absorption
  • Low spectral shift
  • Hard, environmentally durable coatings
Improved Step Coverage
  • Preferred grain sizes and boundaries
  • Minimizes scatter and absorption
Improved Adhesion
  • Films adhere to substrates and each other
  • Control Stoichiometry
  • Predictable and reproducible films
Hollow Cathode Electron Source Retro-fit Kit
Used instead of a tungsten filament, the Hollow Cathode Electron Source (HCES) ensures a Contamination-free environment and reduces maintenance intervals. Intlvac’s new Hollow Cathode Tip can run for over 150 hours before replacement. Our retro-fit kits come complete with everything you need to make the switch.
Hollow Cathode Electron Source Retro-fit Kit
Refurbish & Retrofit
Refurbish & Retrofit
Commonwealth Scientific & Veeco Ion Tech Mark I and Mark II sources

Upgrade your old Commonwealth Scientific or Veeco Ion Tech system to a state of the art Ion source and modern control system utilizing a LabVIEW interface and data logging of your process. Substrate stages can also be refurbished with new parts made to the original specifications

Link to INTLVAC Ion Source Brochure:
Download Brochure


SiSTEM Technology Limited
Grafton Suite, 
Caswell Science & Technology Park
NN12 8EQ , UK


+44 1327 317621

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