- Impressive System Capacity
- Advanced Evaporation Source
- Versatile Wafer Handling
- Automatic Load-Lock for Efficiency
- Wide Range of Applications
Email: info@sistemtechnology.com Call: +44 (0)1327 362 844
Intlvac Thin Film Corporation, a prestigious global provider of thin film deposition systems, has earned a reputation for its dedication to advancing vacuum process technology. With headquarters in Delanson, New York, and manufacturing facilities in Canada, Intlvac Thin Flim has been diligently serving a diverse array of industries since its inception in 1963.
Specialising in the design and manufacture of Ion Beam Etching (IBE), Ion Beam Sputtering (IBS), and Plasma-Enhanced Chemical Vapour Deposition (PECVD) systems, the company caters to the unique needs of sectors such as photonics, aerospace, electronics, and research & development.
Intlvac’s commitment to innovation, coupled with their extensive engineering expertise, has positioned the company as a reliable partner for clients seeking custom-tailored solutions for their thin film deposition requirements. By consistently delivering high-quality equipment and excellent customer service, Intlvac Thin Film Corporation continues to push the boundaries of material science and contribute to the evolution of next-generation technologies.
Superior PVD Deposition Capability
Large Multi-Target Carousel
Rotating and Angle-Tilt Substrate Stage
Ion Assist Capability and Monitoring
High-Density Coatings with Low Particle Levels